Publication2023
Optimization of RF sputtering parameters for improving the optical and electrical properties of β-gallium oxide thin films
The record
- Type
- Publication
- Date
- 1 June 2023
- Level
- National
- Journal
- Bulletin of Materials Science
- Volume
- 46
- Issue
- 2
- Published
- 1 June 2023
- DOI
- 10.1007/s12034-023-02888-5
- Scopus ID
- 85151353759
- ISSN
- 02504707
- Authors
- 3
- Open access
- No
- Citations
- 3
- International co-authorship
- No
- Co-author countries
- IN
Classification
Every label below carries the reasoning it was assigned on, the confidence band it was assigned in, and what produced it. The rubric is published.
UN Sustainable Development Goals
9 Build resilient infrastructure, promote inclusive and sustainable industrialization and foster innovation
Taguchi-grey relational optimization of RF sputtering parameters for beta-gallium oxide thin films demonstrates enhanced optical properties with 3.79 eV bandgap for optoelectronics.
- Moderate confidence
- The alignment is plausible and defensible but rests on an assumption a reasonable reviewer could decline. Published, and surfaced in the review queue for a human to confirm or override.
- Judged
- Judged against the published classification rubric, under the rubric and prompt versions recorded with the run that produced it.
- Produced by
- claude-haiku-4-5-20251001, under kortex-publication-v1
Viksit Bharat @2047
vb-3.4 Intellectual property and deep tech
Semiconductor material research demonstrates intellectual property and deep tech advancement.
- Produced by
- claude-haiku-4-5-20251001, under kortex-publication-v1
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- 1
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Citing this record
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KIIT Deemed to be University. “Optimization of RF sputtering parameters for improving the optical and electrical properties of β-gallium oxide thin films”. Kortex.