Publication2017
Improvement of transconductance and gate source capacitance of Al0.27Ga0.73N/GaN HEMT at 45nm gate length with In0.1Ga0.9N back-barrier
The record
- Type
- Publication
- Date
- 18 October 2017
- Level
- National
- Journal
- Proceedings of 2nd International Conference on 2017 Devices for Integrated Circuit Devic 2017
- Pages
- 131-135
- Published
- 18 October 2017
- DOI
- 10.1109/devic.2017.8073921
- Scopus ID
- 85039930500
- Authors
- 3
- Open access
- No
- Citations
- 1
- International co-authorship
- No
- Co-author countries
- IN
Classification
Every label below carries the reasoning it was assigned on, the confidence band it was assigned in, and what produced it. The rubric is published.
UN Sustainable Development Goals
9.5 Enhance scientific research, upgrade technological capabilities, and increase researchers and R&D spending
Simulation study of Al-GaN/GaN HEMT semiconductor device improves transconductance and capacitance characteristics at reduced gate length
- Moderate confidence
- The alignment is plausible and defensible but rests on an assumption a reasonable reviewer could decline. Published, and surfaced in the review queue for a human to confirm or override.
- Judged
- Judged against the published classification rubric, under the rubric and prompt versions recorded with the run that produced it.
- Produced by
- claude-haiku-4-5-20251001, under kortex-publication-v1
Viksit Bharat @2047
vb-3.4 Intellectual property and deep tech
Advances deep technology through semiconductor device design innovation in high-electron-mobility transistor architectures
- Produced by
- claude-haiku-4-5-20251001, under kortex-publication-v1
Each label above carries the instrument and the version that produced it. How each classification is reached.
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- 1
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Citing this record
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KIIT Deemed to be University. “Improvement of transconductance and gate source capacitance of Al0.27Ga0.73N/GaN HEMT at 45nm gate length with In0.1Ga0.9N back-barrier”. Kortex.
