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by IQAC KIITKIIT Deemed to be University — Internal Quality Assurance Cell

Publication2020

Impact of high mobility III-V compound material of a short channel thin-film SiGe double gate junctionless MOSFET as a source

The record

Type
Publication
Date
1 January 2020
Level
National
Journal
Engineering Reports
Volume
2
Issue
1
Published
1 January 2020
DOI
10.1002/eng2.12086
Scopus ID
85103997013
ISSN
25778196
Authors
2
Open access
Yes
Citations
21
International co-authorship
No
Co-author countries
IN

Classification

Every label below carries the reasoning it was assigned on, the confidence band it was assigned in, and what produced it. The rubric is published.

UN Sustainable Development Goals

  1. 9.5 Enhance scientific research, upgrade technological capabilities, and increase researchers and R&D spending

    TargetPrimaryHigh confidenceJudged

    Junctionless double-gate MOSFET with III-V compound material demonstrates advanced semiconductor device research and RF performance.

    High confidence
    The subject matter is a strong and direct inference from the record type, the funding or organising body, or the programme context, even where the title alone is thin. Example: an ICMR-funded project against SDG 3, on the strength of the agency.
    Judged
    Judged against the published classification rubric, under the rubric and prompt versions recorded with the run that produced it.
    Produced by
    claude-haiku-4-5-20251001, under kortex-publication-v1

Viksit Bharat @2047

  1. vb-3.4 Intellectual property and deep tech

    Sub-themePrimaryModerate confidenceJudged

    Advanced semiconductor intellectual property development contributes to deep tech innovation.

    Moderate confidence
    The alignment is plausible and defensible but rests on an assumption a reasonable reviewer could decline. Published, and surfaced in the review queue for a human to confirm or override.
    Produced by
    claude-haiku-4-5-20251001, under kortex-publication-v1

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Citing this record

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KIIT Deemed to be University. “Impact of high mobility III-V compound material of a short channel thin-film SiGe double gate junctionless MOSFET as a source”. Kortex.

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